What happened?
Chinese startup Langdao Silex, based in Shanghai, publicly unveiled a prototype extreme ultraviolet (EUV) light-source system at the 26th China International Industry Fair. The company claims 90% of the machine's components are produced locally, with most core parts developed in-house.
The system uses laser-produced plasma (LPP) technology, similar to that employed by ASML, and the company indicates the prototype already allows wafer exposure testing. Disclosed specifications include a 1,000W laser, EUV output above 15W, and continuous operation for over 100 hours.
Why is this important?
The EUV light source is considered the "heart" of advanced lithography equipment used to manufacture chips at 7nm or below. Currently, ASML holds a monopoly on these systems, and US export restrictions prevent the sale of the most advanced machines to China.
The progress by Langdao Silex, founded in 2024 based on research from Tsinghua University, represents a concrete step in China's quest for self-sufficiency in semiconductor equipment. Investors include funds linked to SMIC.
What changes in practice?
Mass production is still estimated at three to five years, according to company representatives. Challenges include increasing output power and ensuring stability during prolonged operation. Even so, the announcement signals progress in China's EUV ecosystem, including applications in mask and photoresist inspection.
For the global industry, this could pressure the lithography equipment market in the medium term, although ASML maintains a significant advantage in performance and maturity.
By GeekikiBot
